How to choose water-lubricated air compressor for semiconductor manufacturing

Semiconductor manufacturing industry background

In semiconductor wafer manufacturing, compressed air is widely used in air-bearing bearings of lithography machines, pressure control of etching machines and maintenance of clean room environment. In order to ensure product quality and maintain stable operation of the equipment, compressed air needs to meet the following requirements:

• ISO 8573-1 Class 0(Oil content ≤ 0.01mg/m ³) to avoid lubricating oil aerosols contaminating the wafer surface;
• SEMI F5(Clean compressed air specification), the particle size must be ≤ 0.003 μ m, which conforms to ISO 14644 – 1 Class 1 standard;
• IEC 62368-1(Equipment Safety Standards), requiring the compressed air system to be able to pass 1000 hours of continuous trouble-free operation test.

Data shows that oil-containing compressed air will increase the equipment shutdown rate of the wafer factory by 12%, and the loss of each pollution exceeds $800,000 (data source: SEMI 2024 technical white paper).

Why does semiconductor manufacturing require water-lubricated air compressors

1. Zero lubricating oil pollution：
   • Water lubrication technology uses deionized water instead of lubricating oil (complying with ASTM D1193 pure water standard) to eliminate nano-level hydrocarbon residues (<0.001mg/m³) and avoid oil mist pollution.
2. Ultra-precision filtration：
   • The multi-stage filtration system (HEPA+ULPA) achieves a particulate matter retention rate of ≥99.99995%, passes ISO 29463 testing, and meets the cleanliness requirements of the 3nm process.
3. energy conservation and consumption reduction：
   • The water circulation cooling system can reduce energy consumption by 30%(compliant with the ISO 50001 Energy Management System), and compared with the oil lubrication system, the annual electricity saving reaches ≥ 150,000 kWh.

Selection of core parameters for semiconductor manufacturing (with international standards)

• filtration performance：
  • Filtration accuracy: 0.003μm (passed ISO 16890 classification test)
  • Particulate matter retention rate: ≥99.9999%(compliant with SEMI E78 clean compressed air specification)
• corrosion resistance：
  • Material acid and alkali resistance rating: PH2 -12 (passed ASTM G31 immersion corrosion test)
  • Surface roughness: Ra≤0.4μm (meets ASME B46.1 surface finish standard)
• gas supply stability：
  • Pressure fluctuation: ≤±0.1%(complies with VDMA 15392 dynamic pressure specification)
  • Dew point temperature: ≤-80℃ (certified by ISO 8573-3 Class 1)

Potential risks of semiconductor manufacturing without using water-lubricated air compressors

1. Uncontrolled process pollution：
   • Deposition of lubricant volatiles may cause wafer defect density ≥0.1/cm², violating the SEMI M52 defect density control standard.
2. Equipment life decay：
   • The oil mist reacts with acid gases to form sulfate crystals (particle size 0.05-0.2μm), which accelerates the wear of the vacuum pump and shortens the equipment life by 50%.
3. excessive carbon emissions：
   • The annual carbon emissions of traditional oil lubrication systems reach 180 tons of CO ˇ, exceeding the carbon neutrality target limit of wafer factories.

Economic benefits of using water-lubricated air compressors

Application comparison of water-lubricated air compressor versus oil-lubricated air compressor in semiconductor manufacturing

summary

Through zero oil pollution, nanoscale filtration and closed-loop water circulation technology, water-lubricated air compressors have become the core equipment for the semiconductor manufacturing industry to achieve advanced processes and sustainable production. Shanghai Granklin’s water-lubricated compression technology complies with ISO 8573-1 Class 0 and SEMI F5 standards, and can provide clean compressed air solutions suitable for processes below 2nm for global wafer mills.